dc.contributor.author | Turan, Elif | |
dc.contributor.author | Yılmaz, Gökhan | |
dc.contributor.author | Smirnov, Vladimir | |
dc.contributor.author | Finger, Friedhelm | |
dc.contributor.author | Güneş, Mehmet | |
dc.date.accessioned | 2020-11-20T16:21:57Z | |
dc.date.available | 2020-11-20T16:21:57Z | |
dc.date.issued | 2012 | |
dc.identifier.issn | 0021-4922 | |
dc.identifier.issn | 1347-4065 | |
dc.identifier.uri | https://doi.org/10.1143/JJAP.51.070210 | |
dc.identifier.uri | https://hdl.handle.net/20.500.12809/4095 | |
dc.description | WOS: 000306190500010 | en_US |
dc.description.abstract | Metastability effects in amorphous and microcrystalline silicon thin films induced by exposure to atmospheric gases and water are investigated. A simple procedure is described which allows studying such effects in a reproducible and reliable manner on a short time scale. The method is applied to thin film silicon materials with different structure composition ranging from amorphous to highly crystalline. It is shown that the materials can be brought back into a well defined state even after pro-longed and repeated degradation cycles. (C) 2012 The Japan Society of Applied Physics | en_US |
dc.description.sponsorship | TUBITAK of TurkeyTurkiye Bilimsel ve Teknolojik Arastirma Kurumu (TUBITAK) [108T218]; BMBF of GermanyFederal Ministry of Education & Research (BMBF) [TUR 08/003]; HGF-TUBITAK fellowship programTurkiye Bilimsel ve Teknolojik Arastirma Kurumu (TUBITAK) [IK-TR-07, IK-TR-08] | en_US |
dc.description.sponsorship | We thank T. Chen and M. Hulsbeck for their contributions to this work and U. Rau for continuous support and encouragement. Financial support from TUBITAK of Turkey (project number 108T218), the BMBF of Germany (project number TUR 08/003) and a HGF-TUBITAK fellowship program (project numbers IK-TR-07 and IK-TR-08) is gratefully acknowledged. | en_US |
dc.item-language.iso | eng | en_US |
dc.publisher | Iop Publishing Ltd | en_US |
dc.item-rights | info:eu-repo/semantics/openAccess | en_US |
dc.title | Rapid Reversible Degradation of Silicon Thin Films by a Treatment in Water | en_US |
dc.item-type | article | en_US |
dc.contributor.department | MÜ, Fen Fakültesi, Fizik Bölümü | en_US |
dc.contributor.institutionauthor | Turan, Elif | |
dc.contributor.institutionauthor | Yılmaz, Gökhan | |
dc.identifier.doi | 10.1143/JJAP.51.070210 | |
dc.identifier.volume | 51 | en_US |
dc.identifier.issue | 7 | en_US |
dc.relation.journal | Japanese Journal of Applied Physics | en_US |
dc.relation.publicationcategory | Makale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı | en_US |